Multi-layer Structure Physical Vapor Deposition System Feba 4MI-100-G

Multi-layer Structure Physical Vapor Deposition System Feba 4MI-100-G

Brand: Feba

$90,000 - $300,000 USD

MOQ: 1 pieces

Key Features

Kinematic productivity (conditional process 40 s/chamber): 30 plates/hour

Introduced defectivity, not more: Particles larger than 0,3 µm, not more than 0,1 pcs./cm2

Unevenness of layer application by thickness, not more: 2 set

Unevenness of temperature on the table, not more than: 1.5 million m³

Supplier Information

QUANT LLC

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Description

The unit for physical deposition of multilayer structures ??GE.443255.501 (commercial name "Feba 4MI-100-G") is designed for deposition in one vacuum cycle of multilayer structures including adhesive, barrier, conductive, insulating layers of nitrides, oxides, metals and semiconductors, using magnetron sputtering methods (DC, RF, HiPIMS).

Specifications

Kinematic productivity (conditional process 40 s/chamber)

30 plates/hour

Introduced defectivity, not more

Particles larger than 0,3 µm, not more than 0,1 pcs./cm2

Unevenness of layer application by thickness, not more

2 set

Unevenness of temperature on the table, not more than

1.5 million m³

Accuracy of temperature maintenance during degassing and material application, not worse than

0.5 million m³

Maximum heating temperature during degassing and material application, not less than

350 million m³

Possibility of degassing, heating, ion-plasma cleaning before applying layers

Yes; no

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