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Multi-layer Structure Physical Vapor Deposition System Feba 4MI-100-G

Multi-layer Structure Physical Vapor Deposition System Feba 4MI-100-G — QUANT LLC

Бренд: Feba
$90,000 - $300,000 USD
MOQ: 1 pieces

Негизги мүнөздөмөлөр

Kinematic productivity (conditional process 40 s/chamber): 30 plates/hour
Introduced defectivity, not more: particles larger than 0.3 µm, no more than 0.1 pcs/cm2
Unevenness of layer application by thickness, not more: 2 %
Unevenness of temperature on the table, not more than: 1.5 °C

Сүрөттөмө

The unit for physical deposition of multilayer structures ??GE.443255.501 (commercial name "Feba 4MI-100-G") is designed for deposition in one vacuum cycle of multilayer structures including adhesive, barrier, conductive, insulating layers of nitrides, oxides, metals and semiconductors, using magnetron sputtering methods (DC, RF, HiPIMS).

Мүнөздөмөлөр

Kinematic productivity (conditional process 40 s/chamber)
30 plates/hour
Introduced defectivity, not more
particles larger than 0.3 µm, no more than 0.1 pcs/cm2
Unevenness of layer application by thickness, not more
2 %
Unevenness of temperature on the table, not more than
1.5 °C
Accuracy of temperature maintenance during degassing and material application, not worse than
0.5 °C
Maximum heating temperature during degassing and material application, not less than
350 °C
Possibility of degassing, heating, ion-plasma cleaning before applying layers
yes; no

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