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Multi-layer Structure Physical Vapor Deposition System Feba 4MI-100-G

Multi-layer Structure Physical Vapor Deposition System Feba 4MI-100-G — QUANT LLC

品牌: Feba
¥648,000 - ¥2,160,000 CNY
MOQ: 1 pieces

主要特点

Kinematic productivity (conditional process 40 s/chamber): 30片/小时
Introduced defectivity, not more: 粒子大于0.3微米,不超过0.1个/平方厘米
Unevenness of layer application by thickness, not more: 2 %
Unevenness of temperature on the table, not more than: 1.5 °C

产品描述

The unit for physical deposition of multilayer structures ??GE.443255.501 (commercial name "Feba 4MI-100-G") is designed for deposition in one vacuum cycle of multilayer structures including adhesive, barrier, conductive, insulating layers of nitrides, oxides, metals and semiconductors, using magnetron sputtering methods (DC, RF, HiPIMS).

规格参数

Kinematic productivity (conditional process 40 s/chamber)
30片/小时
Introduced defectivity, not more
粒子大于0.3微米,不超过0.1个/平方厘米
Unevenness of layer application by thickness, not more
2 %
Unevenness of temperature on the table, not more than
1.5 °C
Accuracy of temperature maintenance during degassing and material application, not worse than
0.5 °C
Maximum heating temperature during degassing and material application, not less than
350 °C
Possibility of degassing, heating, ion-plasma cleaning before applying layers
是;否

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