Remote Plasma Photoresist Etching System Vega VS-100-G

Remote Plasma Photoresist Etching System Vega VS-100-G

Brand: Vega

$15,000 - $48,000 USD

MOQ: 1 pieces

Key Features

Self-diagnostic function when the plant is switched on: Yes; no

Introduced defectivity, not more: Particles larger than 0.3 microns, not exceeding 0.06 particles/cm2

Kinematic productivity (at the plate etching process duration of 20 s) per hour, not less than: 20 µGy

Etching rate of photoresistor with oxygen application, not less than: Not less than 10 µm/min when heated not more than 320 degrees Celsius

Supplier Information

QUANT LLC

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Description

The unit for etching of photoresist in remote plasma RLGE.443125.001 (commercial name "Vega VS-100-G") is designed for plasma-chemical removal of photoresist from semiconductor wafers 100/ 150 mm in the conditions of serial production of small-sized products sensitive to induced charge.

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