Name: Remote Plasma Photoresist Etching System Vega VS-100-G
Brand: Vega
SKU: 440712
Availability: InStock

Remote Plasma Photoresist Etching System Vega VS-100-G — QUANT LLC

Бренд: Vega

сом. 163,500 - сом. 523,200 TJS

MOQ: 1 pieces

Хусусиятҳои асосӣ

Self-diagnostic function when the plant is switched on: Yes; no

Introduced defectivity, not more: defectiveness no more than particles larger than 0.3 μm, no more than 0.06 pcs/cm2

Kinematic productivity (at the plate etching process duration of 20 s) per hour, not less than: 20 pcs

Etching rate of photoresistor with oxygen application, not less than: at least 10 µm/min at heating no more than 320 degrees Celsius

Тавсиф

The unit for etching of photoresist in remote plasma RLGE.443125.001 (commercial name "Vega VS-100-G") is designed for plasma-chemical removal of photoresist from semiconductor wafers 100/ 150 mm in the conditions of serial production of small-sized products sensitive to induced charge.

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Remote Plasma Photoresist Etching System Vega VS-100-G — QUANT LLC

Хусусиятҳои асосӣ

Тавсиф

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Vacuum Coating System for Metallic Films Oratoria 29M

Compact Vacuum Coating System for Magnetron Sputtering, Model MVU Magna 12

Compact Plasma Cleaning Vacuum System for Photoresist Removal and Sterilization TM 4

Vacuum Coating System with Magnetron Sputtering and Cassette Loading MAGNA TM 29

Plasma Chemical Deposition Vacuum System with ICP Source and Cassette Loader

Automated Ion-Plasma Coating System MAP-3

High-Density Coating Application System NIKA-15101

Plasma Chemical Anisotropic Selective Etching System Plasma TM 200-01

Vacuum Coating System UVN-71P-3M-1

High-Performance Vacuum Coating System Kurchatov

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