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Bosh sahifa / Sanoat uskunalari / Texnologik uskunalar / Vakuumli püskürtme va plazmokimyo qurilmalari / Remote Plasma Photoresist Etching System Vega VS-100-G
Bosh sahifa Sanoat uskunalari Texnologik uskunalar Vakuumli püskürtme va plazmokimyo qurilmalari
Remote Plasma Photoresist Etching System Vega VS-100-G

Remote Plasma Photoresist Etching System Vega VS-100-G — QUANT LLC

Brend: Vega
so'm 189,000,000 - so'm 604,800,000 UZS
MOQ: 1 pieces

Asosiy xususiyatlar

Self-diagnostic function when the plant is switched on: Yes; no
Introduced defectivity, not more: defectiveness no more than particles larger than 0.3 μm, no more than 0.06 pcs/cm2
Kinematic productivity (at the plate etching process duration of 20 s) per hour, not less than: 20 pcs
Etching rate of photoresistor with oxygen application, not less than: at least 10 µm/min at heating no more than 320 degrees Celsius

Tavsif

The unit for etching of photoresist in remote plasma RLGE.443125.001 (commercial name "Vega VS-100-G") is designed for plasma-chemical removal of photoresist from semiconductor wafers 100/ 150 mm in the conditions of serial production of small-sized products sensitive to induced charge.

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Bog'liq kategoriyalar
Santrifüjlar va dekanterlar
Ustunlar va issiqlik almashinuvi uskunalari
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To'ldirish, qadoqlash va qadoqlash mashinalari
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