Name: Ion Source II-250 for Ion Beam Applications
Brand: null
SKU: 430682
Availability: InStock

Ion Source II-250 for Ion Beam Applications — LVT+ LLC

Brand: null

$900 - $3,600 USD

MOQ: 2 pieces

Key Features

Overall dimensions, (length x width x height): 226 x 100 x 115 mm

Power supply voltage: 500-5000 V

dust and moisture protection: yes - the case is made of metal, has no exposed conductive parts

Type of construction: built-in

Description

Ion source ??-250 is designed for generation of linear flow of working gas ions with energy 300-2500 eV for a wide range of applications: ion cleaning, ion etching, ion polishing, ion surface modification, assisted sputtering.

Operation Manual is available on request: LCMK.244.00.00.00.00.000 RE SOURCE IONS II-250.

Specifications

Overall dimensions, (length x width x height)

226 x 100 x 115 mm

Power supply voltage

500-5000 V

dust and moisture protection

yes - the case is made of metal, has no exposed conductive parts

Type of construction

built-in

Warranty period of operation of the device

Warranty shelf life of the device

Climatic designs

GOST 15150-69; GOST 15543-70 under normal values of climatic factors of the environment - UHL for placement category 4.2.

Beam shape

hollow rectangular

Bundle dimensions, (length x width x thickness)

200 x 42 x 5 mm

Operating pressure range in the chamber

0,001-10

Working gas

any that does not cause deposition of high-resistance layers on device parts

Working fluid (recommended)*

distilled water, 20% ethanol solution in distilled water according to GOST 6709-72

Weight, not more

3,7

purpose

designed for generating a linear flow of working gas ions with energy 300-2500 eV for a wide range of applications: ion cleaning, ion etching, ion polishing, ion surface modification, assisting in spraying

type

version -00