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Ion Source II-250 for Ion Beam Applications

Ion Source II-250 for Ion Beam Applications — LVT+ LLC

Brend: null
₼1,530 - ₼6,120 AZN
MOQ: 2 pieces

Əsas xüsusiyyətlər

Overall dimensions, (length x width x height): 226 x 100 x 115 mm
Power supply voltage: 500-5000 V
dust and moisture protection: yes - the case is made of metal, has no exposed conductive parts
Type of construction: built-in

Təsvir

Ion source ??-250 is designed for generation of linear flow of working gas ions with energy 300-2500 eV for a wide range of applications: ion cleaning, ion etching, ion polishing, ion surface modification, assisted sputtering.

Operation Manual is available on request: LCMK.244.00.00.00.00.000 RE SOURCE IONS II-250.

Spesifikasiyalar

Overall dimensions, (length x width x height)
226 x 100 x 115 mm
Power supply voltage
500-5000 V
dust and moisture protection
yes - the case is made of metal, has no exposed conductive parts
Type of construction
built-in
Warranty period of operation of the device
18
Warranty shelf life of the device
6
Climatic designs
GOST 15150-69; GOST 15543-70 under normal values of climatic factors of the environment - UHL for placement category 4.2.
Beam shape
hollow rectangular
Bundle dimensions, (length x width x thickness)
200 x 42 x 5 mm
Operating pressure range in the chamber
0,001-10
Working gas
any that does not cause deposition of high-resistance layers on device parts
Working fluid (recommended)*
distilled water, 20% ethanol solution in distilled water according to GOST 6709-72
Weight, not more
3,7
purpose
designed for generating a linear flow of working gas ions with energy 300-2500 eV for a wide range of applications: ion cleaning, ion etching, ion polishing, ion surface modification, assisting in spraying
type
version -00

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