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Ion Source II-250 for Ion Beam Applications

Ion Source II-250 for Ion Beam Applications — LVT+ LLC

品牌: null

¥6,480 - ¥25,920 CNY

MOQ: 2 pieces

主要特点

Overall dimensions, (length x width x height): 226 x 100 x 115 mm

Power supply voltage: 500-5000 V

防尘防潮: 是 - 外壳由金属制成，没有裸露的导电部分

Type of construction: 内置

供应商信息

LVT+ LLC

🇷🇺 📦 🏭 🛡️

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快速询价

产品描述

Ion source ??-250 is designed for generation of linear flow of working gas ions with energy 300-2500 eV for a wide range of applications: ion cleaning, ion etching, ion polishing, ion surface modification, assisted sputtering.

Operation Manual is available on request: LCMK.244.00.00.00.00.000 RE SOURCE IONS II-250.

规格参数

Overall dimensions, (length x width x height)

226 x 100 x 115 mm

Power supply voltage

500-5000 V

防尘防潮

是 - 外壳由金属制成，没有裸露的导电部分

Type of construction

内置

Warranty period of operation of the device

18

Warranty shelf life of the device

6

Climatic designs

GOST 15150-69；GOST 15543-70在正常气候环境因素值下 - UHL用于放置类别4.2。

Beam shape

空心矩形

Bundle dimensions, (length x width x thickness)

200 x 42 x 5 mm

Operating pressure range in the chamber

0,001-10

Working gas

任何不导致设备部件上沉积高阻层的气体

Working fluid (recommended)*

蒸馏水，20%乙醇溶液（符合GOST 6709-72）

Weight, not more

3,7

用途

用于生成能量为300-2500电子伏特的工作气体离子的线性流动，适用于广泛的应用：离子清洗、离子蚀刻、离子抛光、离子表面改性、喷涂辅助

类型

版本 -00

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