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Home / Other (draft root) / Photoresist developer / Non-Metal Developer PP-051MS for Photolithography Applications
Home Other (draft root) Photoresist developer
Non-Metal Developer PP-051MS for Photolithography Applications

Non-Metal Developer PP-051MS for Photolithography Applications — NIOPIK OJSC

Brand: NIOPIK
$9 - $36 USD
MOQ: 200 liters

Key Features

Specific electrical conductivity, ohm-1m-1: 5,08 - 5,15
Concentration of carbon dioxide salts (in terms of CO32-), %, max.: 0,05
Concentration of tetramethylammonium hydroxide, %: 2...2.39 %
appearance: transparent colorless liquid without visible mechanical inclusions

Description

for use in microlithography processes for developing positive and negative photoresist films

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