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首页 / Other (draft root) / Photoresist developer / Non-Metal Developer PP-051MS for Photolithography Applications
首页 Other (draft root) Photoresist developer
Non-Metal Developer PP-051MS for Photolithography Applications

Non-Metal Developer PP-051MS for Photolithography Applications — NIOPIK OJSC

品牌: NIOPIK
¥64.80 - ¥259.20 CNY
MOQ: 200 liters

主要特点

Specific electrical conductivity, ohm-1m-1: 5,08 - 5,15
Concentration of carbon dioxide salts (in terms of CO32-), %, max.: 0,05
Concentration of tetramethylammonium hydroxide, %: 2...2.39 %
外观: 无可见机械杂质的透明无色液体

产品描述

for use in microlithography processes for developing positive and negative photoresist films

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