Ion Source II-145 for Ion Beam Applications

Ion Source II-145 for Ion Beam Applications

Brand: null

$900 - $3,600 USD

MOQ: 2 pieces

Key Features

Power supply voltage: 1000-5000 thousand m³

Overall dimensions, (length x width x height): 146x74x151 mm

Assignment: designed to generate a linear flow of working gas ions with energy 300-2500 eV for a wide range of applications: ion cleaning, ion etching, ion polishing, ion surface modification, assisted sputtering.

Dustproof: Check - Enclosure is made of metal, no exposed live parts.

Supplier Information

LVT+ LLC

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Description

Ion source ??-145 is designed for generation of linear flow of working gas ions with energy 300-2500 eV for a wide range of applications: ion cleaning, ion etching, ion polishing, ion modification of
surface, assisted sputtering.

Operation Manual is available on request: LCMK.247.00.00.00.00.000 RE ION SOURCE II-145.

Specifications

Power supply voltage

1000-5000 thousand m³

Overall dimensions, (length x width x height)

146x74x151 mm

Assignment

designed to generate a linear flow of working gas ions with energy 300-2500 eV for a wide range of applications: ion cleaning, ion etching, ion polishing, ion surface modification, assisted sputtering.

Dustproof

Check - Enclosure is made of metal, no exposed live parts.

Type of construction

Built-in

Warranty period of operation of the device

18 kWh

Warranty shelf life of the device

6 kWh

Climatic designs

GOST 15150-69; GOST 15543-70 at normal values of climatic factors of external environment - UHL for product placement category 4.2.

Beam shape

hollow rectangular

Bundle dimensions, (length x width x thickness)

120x42x5 mm

Operating pressure range in the chamber

0,001-10 t

Working gas

Any colour that does not cause deposition of high-resistance layers on the device parts

Working fluid (recommended)*

Distilled water, 20% solution of ethyl alcohol in distilled water according to GOST 6709-72

Weight, not more

3 m² living area

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