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Ion Source II-125 for Ion Beam Applications

Ion Source II-125 for Ion Beam Applications — LVT+ LLC

Brand: null
$900 - $3,600 USD
MOQ: 2 pieces

Key Features

Overall dimensions, (length x width x height): 126 x 74 x 136 mm
Power supply voltage: 1500-5000 V
dust and moisture protection: yes - the case is made of metal, has no exposed conductive parts
Type of construction: built-in

Description

Ion source II-125 is designed to generate a linear flow of working gas ions with energy 300-2500 eV for a wide range of applications: ion cleaning, ion etching, ion polishing, ion modification of the

surface, assisted sputtering.

Operation Manual is available on request: LCMK.257.00.00.00.00 RE ION SOURCE II-125.

Specifications

Overall dimensions, (length x width x height)
126 x 74 x 136 mm
Power supply voltage
1500-5000 V
dust and moisture protection
yes - the case is made of metal, has no exposed conductive parts
Type of construction
built-in
Warranty period of operation of the device
18
Warranty shelf life of the device
6
Climatic designs
GOST 15150-69; GOST 15543-70 under normal values of climatic factors of the environment - UHL for placement category 4.2.
Beam shape
hollow rectangular
Bundle dimensions, (length x width x thickness)
93 x 42 x 5 mm
Operating pressure range in the chamber
0,001-10
Working gas
any that does not cause deposition of high-resistance layers on device parts
Working fluid (recommended)*
distilled water, 20% ethanol solution in distilled water according to GOST 6709-72
Weight, not more
3 kg
purpose
designed for generating a linear flow of working gas ions with energy 300-2500 eV for a wide range of applications: ion cleaning, ion etching, ion polishing, ion surface modification, assisting in spraying.

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