Ion Source II-125 for Ion Beam Applications — LVT+ LLC

Name: Ion Source II-125 for Ion Beam Applications
Brand: null
SKU: 94392
Availability: InStock

Бренд: null

$900 - $3,600 USD

MOQ: 2 pieces

Хусусиятҳои асосӣ

Overall dimensions, (length x width x height): 126 x 74 x 136 mm

Power supply voltage: 1500-5000 V

dust and moisture protection: yes - the case is made of metal, has no exposed conductive parts

Type of construction: built-in

Маълумот дар бораи таъминкунанда

LVT+ LLC

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Дидани ҳамаи маҳсулот (37)

Дархости тез

Тавсиф

Ion source II-125 is designed to generate a linear flow of working gas ions with energy 300-2500 eV for a wide range of applications: ion cleaning, ion etching, ion polishing, ion modification of the

surface, assisted sputtering.

Operation Manual is available on request: LCMK.257.00.00.00.00 RE ION SOURCE II-125.

Хусусиятҳо

Overall dimensions, (length x width x height)

126 x 74 x 136 mm

Power supply voltage

1500-5000 V

dust and moisture protection

yes - the case is made of metal, has no exposed conductive parts

Type of construction

built-in

Warranty period of operation of the device

Warranty shelf life of the device

Climatic designs

GOST 15150-69; GOST 15543-70 under normal values of climatic factors of the environment - UHL for placement category 4.2.

Beam shape

hollow rectangular

Bundle dimensions, (length x width x thickness)

93 x 42 x 5 mm

Operating pressure range in the chamber

0,001-10

Working gas

any that does not cause deposition of high-resistance layers on device parts

Working fluid (recommended)*

distilled water, 20% ethanol solution in distilled water according to GOST 6709-72

Weight, not more

3 kg

purpose

designed for generating a linear flow of working gas ions with energy 300-2500 eV for a wide range of applications: ion cleaning, ion etching, ion polishing, ion surface modification, assisting in spraying.

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Ion Source II-125 for Ion Beam Applications — LVT+ LLC

Хусусиятҳои асосӣ

Тавсиф

Хусусиятҳо

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