Name: Plasma Chemical Etching Vacuum System with ICP Source and Cassette Loading TM 300
Brand: PLASMA TM
SKU: 560538
Availability: InStock

Plasma Chemical Etching Vacuum System with ICP Source and Cassette Loading TM 300 — NIITM OJSC

Brand: PLASMA TM

$90,000 - $360,000 USD

MOQ: 1 pieces

Key Features

length: 3200 mm

width: 1600 mm

height: 1800 mm

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Description

Processing of plates in one technological cycle:
60x48 mm - 19 pcs, Ø 76 mm - 13 pcs, Ø 100 mm - 7 pcs,
Ø 150 mm - 3 pieces, Ø 200 mm - 1 piece, Ø 300 mm - 1 piece;
Sluice chamber for loading - unloading of substrates on the carrier
from cassette to cassette;
Transport system for transferring the substrates on the carrier from the airlock to the working chamber based on the manipulator arm.
working chamber on the basis of manipulator;
Reactor wall heating up to 60°C;
Helium cooling and mechanical clamping of the carrier;
Working gases: Cl?, HBr, SF?, CF?, CHF?, O?, Ar, He and others;
Consumption power not more than 21 kW;
Oil-free pumping system;
Possibility to build in the clean room.