NIITM OJSC

VACUUM UNIT FOR PLASMA CHEMICAL VAPOUR DEPOSITION OF LAYERS FROM GAS PHASE WITH ICP SOURCE AND SLUICE LOADING FROM CASSETTE TO C Price on request Plasma-Chemical Deposition Vacuum System with ICP Source - Izofaz TM 200-01 from $90,000 Four-Position Vacuum Coating System with Magnetron Sputtering MAGNA TM 5 from $90,000 Vacuum film application machine by magnetron MAGNA TM 300 sputtering and sluice loading from cassette to cassette Price on request Plasma Chemical Etching Vacuum System with ICP Source and Cassette Loading TM 300 from $90,000 Compact Vacuum Coating System for Magnetron Sputtering, Model MVU Magna 12 from $90,000 Compact Plasma Cleaning Vacuum System for Photoresist Removal and Sterilization TM 4 from $15,000 Industrial-Oriented Technological Complex Cluster TM 200 from $900,000 Gallium Nitride Epitaxy System for Power Transistors TM 200-01 from $900,000 Vacuum Coating System with Magnetron Sputtering and Cassette Loading MAGNA TM 29 from $90,000 Plasma Chemical Deposition Vacuum System with ICP Source and Cassette Loader from $90,000 Deep Anisotropic Etching Vacuum System MVU TM PLASMA 06 from $42,000 Plasma Chemical Anisotropic Selective Etching System Plasma TM 200-01 from $90,000 Magnetron Sputtering Vacuum Coating System Magna TM 22 from $90,000 Magnetron Sputtering Vacuum Coating System MAGNA TM 7 from $42,000 Magnetron Sputtering Vacuum Coating System Magna TM 22 from $90,000 Plasma Etching Vacuum System with ICP Plasma Source TM 9 from $90,000 Reactive Ion Etching Vacuum System with Load Lock PLASMA TM 7 from $42,000 Reactive Ion Etching Vacuum System with Cassette to Cassette Load, Plasma TM 8 from $90,000 Four-Position Vacuum Coating System with Magnetron Sputtering and Electron Beam Evaporation, Model: 4P-VAC-2023 from $90,000