Vacuum spraying unit UVN-71P-3M-1

The vacuum spraying unit UVN-71P-3M-1 is designed for
one-sided deposition of metallic and resistive films on polycor and
sithallic substrates by thermal vacuum sputtering in the production of
hybrid-film microcircuits.
Maximum number of substrates with the size of
60x48x(0,5...1,0) mm 11 pcs.
The unit has 4 resistive evaporators.
Time to reach the residual pressure of 4 x 10-4 Pa in the working chamber
after opening of the high-vacuum shutter not more than 60 min.
The unit provides:
-regulation of rotation speed of the carousel with
substrates in the range from 10 to 60 rpm;
-heating of the carousel with substrates up to 300 °C;
-control of the witness resistance
of film sputtering on substrates in the range from 0 to 100 kOhm;
-power of the ion source up to 200 W;
-power of the first resistive evaporator
up to 0.8 kW at current up to 50 A;
-power of the second, third and fourth
power of the second, third and fourth resistive evaporators each up to 2 kW at current up to 500 A