Four-position vacuum unit for film deposition by magnetron sputtering and electron-beam evaporation method with airlock

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Industrial-oriented technological complex Cluster TM 200

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Vacuum spraying unit UVN-74P-3M-2

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NIKA-15102 coating unit

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MAGNA TM 7 magnetron sputtering vacuum film spraying unit

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SMALL-SIZE VACUUM UNIT FOR FILM DEPOSITION BY MAGNETRON SPUTTERING OF MATERIAL ON SUBSTRATE MVU TM MAGNA 12

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Installation for washing of radio-electronic assemblies on printed circuit boards

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VACUUM UNIT FOR PLASMA CHEMICAL LAYER ETCHING WITH ICP SOURCE AND SLUICE LOADING FROM CASSETTE TO CASSETTE PLASMA TM 300

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Metallised Photo Template 44x50mm

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VACuum unit for plasma-chemical deposition of layers from gas phase with ICP source and sluice loading: Isofaz TM 200-01

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Vacuum deposition unit UVN-74P-3M-1

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SMALL-SIZE VACUUM UNIT FOR DEEP ANISOTROPIC ETCHING MVU TM PLASMA 06

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