NIITM OJSC

Plasma-Chemical Deposition Vacuum System with ICP Source - Izofaz TM 200-01 from $90,000 Four-Position Vacuum Coating System with Magnetron Sputtering MAGNA TM 5 from $90,000 Plasma Chemical Etching Vacuum System with ICP Source and Cassette Loading TM 300 from $90,000 Compact Vacuum Coating System for Magnetron Sputtering, Model MVU Magna 12 from $90,000 Compact Plasma Cleaning Vacuum System for Photoresist Removal and Sterilization TM 4 from $15,000 Industrial-Oriented Technological Complex Cluster TM 200 from $900,000 Gallium Nitride Epitaxy System for Power Transistors TM 200-01 from $900,000 Vacuum Coating System with Magnetron Sputtering and Cassette Loading MAGNA TM 29 from $90,000 Plasma Chemical Deposition Vacuum System with ICP Source and Cassette Loader from $90,000 Deep Anisotropic Etching Vacuum System MVU TM PLASMA 06 from $42,000 Plasma Chemical Anisotropic Selective Etching System Plasma TM 200-01 from $90,000 Magnetron Sputtering Vacuum Coating System Magna TM 22 from $90,000 Magnetron Sputtering Vacuum Coating System MAGNA TM 7 from $42,000 Magnetron Sputtering Vacuum Coating System Magna TM 22 from $90,000 Plasma Etching Vacuum System with ICP Plasma Source TM 9 from $90,000 Reactive Ion Etching Vacuum System with Load Lock PLASMA TM 7 from $42,000 Reactive Ion Etching Vacuum System with Cassette to Cassette Load, Plasma TM 8 from $90,000 Four-Position Vacuum Coating System with Magnetron Sputtering and Electron Beam Evaporation, Model: 4P-VAC-2023 from $90,000