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Processing Equipment in NIITM OJSC

Verified Manufacturer 11 products All products by this supplier (18) INN: 7735043966
Г.МОСКВА Medium enterprise
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Verified Russian Manufacturer INN Registered Export-Ready
Main Markets
EAEU · MENA · GCC · Southeast Asia · China · Africa · Worldwide
Payment Terms
T/T · L/C · Escrow via Tonzar · USDT · Bank Transfer
Incoterms
FOB · EXW · CFR · CIF · DAP · DDP
OEM / ODM Service
Custom orders welcome — submit RFQ for spec, branding, packaging.
Avg. Response
within 24h via Tonzar

Catalog by Category

Brands by this Supplier

All Processing Equipment by NIITM OJSC

Showing 11 of 11 · Page 1 / 1
Plasma-Chemical Deposition Vacuum System with ICP Source - Izofaz TM 200-01

Plasma-Chemical Deposition Vacuum System with ICP Source - Izofaz TM 200-01

from $90,000
Four-Position Vacuum Coating System with Magnetron Sputtering MAGNA TM 5

Four-Position Vacuum Coating System with Magnetron Sputtering MAGNA TM 5

from $90,000
Plasma Chemical Etching Vacuum System with ICP Source and Cassette Loading TM 300

Plasma Chemical Etching Vacuum System with ICP Source and Cassette Loading TM 300

from $90,000
Compact Vacuum Coating System for Magnetron Sputtering, Model MVU Magna 12

Compact Vacuum Coating System for Magnetron Sputtering, Model MVU Magna 12

from $90,000
Compact Plasma Cleaning Vacuum System for Photoresist Removal and Sterilization TM 4

Compact Plasma Cleaning Vacuum System for Photoresist Removal and Sterilization TM 4

from $15,000
Industrial-Oriented Technological Complex Cluster TM 200

Industrial-Oriented Technological Complex Cluster TM 200

from $900,000
Vacuum Coating System with Magnetron Sputtering and Cassette Loading MAGNA TM 29

Vacuum Coating System with Magnetron Sputtering and Cassette Loading MAGNA TM 29

from $90,000
Plasma Chemical Deposition Vacuum System with ICP Source and Cassette Loader

Plasma Chemical Deposition Vacuum System with ICP Source and Cassette Loader

from $90,000
Plasma Chemical Anisotropic Selective Etching System Plasma TM 200-01

Plasma Chemical Anisotropic Selective Etching System Plasma TM 200-01

from $90,000
Plasma Etching Vacuum System with ICP Plasma Source TM 9

Plasma Etching Vacuum System with ICP Plasma Source TM 9

from $90,000
Reactive Ion Etching Vacuum System with Cassette to Cassette Load, Plasma TM 8

Reactive Ion Etching Vacuum System with Cassette to Cassette Load, Plasma TM 8

from $90,000

About this supplier

NIITM OJSC manufactures 11 product(s) in Processing Equipment on Tonzar B2B. This page lists every SKU by NIITM OJSC in this category — wholesale prices in USD, MOQ per item, OEM/ODM accepted. Source directly via Tonzar with verified contracts, escrow payments and worldwide logistics.

Send your message to NIITM OJSC

Source directly from this Russian manufacturer via Tonzar — get a personal quote, factory video, samples and shipping options within one business day.

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Company Details

Legal Name АКЦИОНЕРНОЕ ОБЩЕСТВО "НАУЧНО-ИССЛЕДОВАТЕЛЬСКИЙ ИНСТИТУТ ТОЧНОГО МАШИНОСТРОЕНИЯ"
INN 7735043966
OGRN 1027700037749
KPP 773501001
Registered Address 124460, Г.МОСКВА, ЗЕЛЕНОГРАД Г., ПР-КТ ПАНФИЛОВСКИЙ, Д.10
Region Г.МОСКВА
Phone 229-75-02
Main Activity (OKVED) 28.99.2
Company Size Medium enterprise

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