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All Processing Equipment by NIITM OJSC
Plasma-Chemical Deposition Vacuum System with ICP Source - Izofaz TM 200-01
from $90,000Four-Position Vacuum Coating System with Magnetron Sputtering MAGNA TM 5
from $90,000Plasma Chemical Etching Vacuum System with ICP Source and Cassette Loading TM 300
from $90,000Compact Vacuum Coating System for Magnetron Sputtering, Model MVU Magna 12
from $90,000Compact Plasma Cleaning Vacuum System for Photoresist Removal and Sterilization TM 4
from $15,000Industrial-Oriented Technological Complex Cluster TM 200
from $900,000Vacuum Coating System with Magnetron Sputtering and Cassette Loading MAGNA TM 29
from $90,000Plasma Chemical Deposition Vacuum System with ICP Source and Cassette Loader
from $90,000Plasma Chemical Anisotropic Selective Etching System Plasma TM 200-01
from $90,000Plasma Etching Vacuum System with ICP Plasma Source TM 9
from $90,000Reactive Ion Etching Vacuum System with Cassette to Cassette Load, Plasma TM 8
from $90,000About this supplier
NIITM OJSC manufactures 11 product(s) in Processing Equipment on Tonzar B2B. This page lists every SKU by NIITM OJSC in this category — wholesale prices in USD, MOQ per item, OEM/ODM accepted. Source directly via Tonzar with verified contracts, escrow payments and worldwide logistics.
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