The electrodeless radio-frequency plasma generator is designed for creation and maintenance of gas-discharge low-temperature plasma in working volumes of vacuum technological installations in continuous mode and is used at:
- material sputtering in plasma of inert or chemically active gases
- ion and plasma chemical etching
- evaporation, with additional vapour ionisation
- plasma-stimulated vapour deposition
- ionic surface modification (oxidation, reduction, nitriding, carbidisation)
- ionic cleaning and assisted
- high-temperature annealing
The RPG-128 is equipped with:
- flat coil
- removable quartz glass shield to protect the working surface
- coaxial input with shank for connection of RF power source
*Operational Manual is available on request: LCMK.219.00.00.00.00.000-02 RE Radiofrequency PLASMA GENERATOR RPG-128
It is allowed to deliver the device as a part of the installation without packing.
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