The Kurchatov vacuum sputtering platform is designed to create high-performance sputtering equipment. Plants built on this platform are designed for use in serial and high-volume production.
The key feature of this platform is the placement of technological devices on the side walls of the vacuum chamber in special hinged compartments, which greatly simplifies the change of targets and maintenance of technological devices. The substrates are placed on a flat substrate holder, which moves in the process chamber on the principle of a conveyor.
Advantages:
High productivity
All elements of the vacuum system are made of non-magnetic stainless steel 12X18H10T/AISI321, 08X18H10/ AISI304.
Vacuum-facing surfaces are machined to Ra0.8 roughness, which guarantees minimum degassing and, as a consequence, reduced pumping time.
Possibility of using several process devices...
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