MAGNETRON SPUTTERING VACUUM COATING PLANT WITH SLUICE LOADING FROM CASSETTE TO CASSETTE MAGNA TM 29

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Installation for deposition of thin films of metals, resistive alloys and dielectrics by magnetron ion-beam sputtering method.

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VACUUM UNIT FOR PLASMA CHEMICAL VAPOUR DEPOSITION OF LAYERS FROM GAS PHASE WITH ICP SOURCE AND SLUICE LOADING FROM CASSETTE TO C

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VACUUM UNIT FOR REACTIVE-ION ETCHING OF LAYERS WITH SLUICE LOADING FROM CASSETTE TO CASSETTE PLASMA TM 8

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VACUUM UNIT FOR PLASMA CHEMICAL ETCHING OF LAYERS WITH ICP SOURCE PLASMA TM 9

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NIKA-15102 coating unit

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Molecular layering unit

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Photolithography cluster line

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Vacuum spraying unit UVN-74P-3M-2

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Vacuum unit for reactive-ion layer etching with sluice loading PLASMA TM 7

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MAGNA TM 7 magnetron sputtering vacuum film spraying unit

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Vacuum deposition unit UVN-71P-3M-2

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