Solder paste melting furnace

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Vacuum spraying machine Oratorio 9-1

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SMALL-SIZE VACUUM UNIT FOR FILM DEPOSITION BY MAGNETRON SPUTTERING OF MATERIAL ON SUBSTRATE MVU TM MAGNA 12

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Installation of plasma-chemical anisotropic selective etching Plasma TM 200-01

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Four-position vacuum unit for film deposition by magnetron sputtering and electron-beam evaporation method with airlock

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Installation for deposition of thin films of metals, resistive alloys and dielectrics by magnetron ion-beam sputtering method.

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VACuum unit for plasma-chemical deposition of layers from gas phase with ICP source and sluice loading: Isofaz TM 200-01

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Molecular layering unit

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VACUUM UNIT FOR PLASMA CHEMICAL ETCHING OF LAYERS WITH ICP SOURCE PLASMA TM 9

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Vacuum spraying unit UVN-71P-3M-1

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Vacuum unit for reactive-ion layer etching with sluice loading PLASMA TM 7

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Vacuum deposition unit UVN-71P-3M-2

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