Products — Установки вакуумного напыления и плазмохимии
Plasma-Chemical Deposition Vacuum System with ICP Source - Izofaz TM 200-01
US$90,000-360,000
NIITM OJSC 🇷🇺
Four-Position Vacuum Coating System with Magnetron Sputtering MAGNA TM 5
US$90,000-300,000
NIITM OJSC 🇷🇺
Plasma Chemical Etching Vacuum System with ICP Source and Cassette Loading TM 300
US$90,000-360,000
NIITM OJSC 🇷🇺
Compact Vacuum Coating System for Magnetron Sputtering, Model MVU Magna 12
US$90,000-300,000
NIITM OJSC 🇷🇺
Compact Plasma Cleaning Vacuum System for Photoresist Removal and Sterilization TM 4
US$15,000-48,000
NIITM OJSC 🇷🇺
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Vacuum Coating System with Magnetron Sputtering and Cassette Loading MAGNA TM 29
US$90,000-300,000
NIITM OJSC 🇷🇺
Plasma Chemical Deposition Vacuum System with ICP Source and Cassette Loader
US$90,000-360,000
NIITM OJSC 🇷🇺
Automated Ion-Plasma Coating System MAP-3
US$90,000-360,000
National Research Center "Kurchatov Institute" - VIAM 🇷🇺
Plasma Chemical Anisotropic Selective Etching System Plasma TM 200-01
US$90,000-300,000
NIITM OJSC 🇷🇺
Continuous Vacuum Unit for Containers and Pipelines up to 1.2 m³ - GRSI.306586.002
US$9,000-36,000
HERMES OJSC 🇷🇺
Anisotropic Plasma Etching System for Silicon Plates up to 200 mm – ESTOХORS
US$90,000-360,000
ESTO OJSC 🇷🇺
Automated Coating System "MAP-2" for Ion-Plasma Coatings
US$90,000-360,000
National Research Center "Kurchatov Institute" - VIAM 🇷🇺
