A microwave plasma chemical reactor for growing poly- and single-crystal diamonds with defined properties by microwave plasma chemical vapour deposition (MP CVD). ARDIS is the latest system with an extended set of control and diagnostic functions. The plant allows the growth of gem-quality diamonds.
Adjustable substrate holder with a Z-axis stroke of 10 mm. Flow into the chamber less than 1 mtorr/hour. High vacuum < 2*10-7 torr.
Double beam pyrometer. Designed for vapour phase deposition of poly-, mono- and nanocrystalline diamond films as well as carbon nanotubes for various applications. Microwave plasma-chemical reactor ARDIS 300 is designed for vapour deposition of poly-, mono- and nanocrystalline diamond films as well as carbon nanotubes for various applications.
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