Magnetron Sputtering Vacuum Coating System MAGNA TM 7 for Efficient Film Application

Number of MRUs in the installation - 2 pcs;
Processing of substrates in one technological cycle (one-sided processing): 60x48 - 17 pcs;
Heating of substrates up to 300°C;
Control of resistive film thickness by resistance;
Number of ion sources - 1 pc;
Oil-free pumping system (TMN1300);
Microprocessor control system;
Consumption power not more than 4.5 kW;
The area occupied by one installation ~ 3 m2.