Available for Import
Ion Source II-250 for Ion Beam Applications - Versatile Ion Generation
Bulk pricing available
FOB, CIF & EXW terms available
Description
Ion source ??-250 is designed for generation of linear flow of working gas ions with energy 300-2500 eV for a wide range of applications: ion cleaning, ion etching, ion polishing, ion surface modification, assisted sputtering.
Operation Manual is available on request: LCMK.244.00.00.00.00.000 RE SOURCE IONS II-250.
Specifications
Note: All specifications are provided by the manufacturer and may be subject to change. Please contact us to confirm the latest specifications before placing your order.
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