Available for Import

Ion Source II-125 for Ion Beam Applications and Ion Processing

Electrical Interface Devices

Manufacturer:LVT+ LLC

Price:Request Quote

Bulk pricing available

FOB, CIF & EXW terms available

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Description

Ion source II-125 is designed to generate a linear flow of working gas ions with energy 300-2500 eV for a wide range of applications: ion cleaning, ion etching, ion polishing, ion modification of the surface, assisted sputtering.

Operation Manual is available on request: LCMK.257.00.00.00.00 RE ION SOURCE II-125.

Specifications

Assignment

designed to generate a linear flow of working gas ions with energy 300-2500 eV for a wide range of applications: ion cleaning, ion etching, ion polishing, ion surface modification, assisted sputtering.

Dustproof

Check - Enclosure is made of metal, no exposed live parts.

Type of construction

Built-in

Warranty period of operation of the device

Warranty shelf life of the device

Climatic designs

GOST 15150-69; GOST 15543-70 at normal values of climatic factors of external environment - UHL for product placement category 4.2.

Power supply voltage

1500-5000 V

Beam shape

hollow rectangular

Bundle dimensions, (length x width x thickness)

93x42x5 mm

Operating pressure range in the chamber

0,001-10

Working gas

Any colour that does not cause deposition of high-resistance layers on the device parts

Working fluid (recommended)*

Distilled water, 20% solution of ethyl alcohol in distilled water according to GOST 6709-72

Overall dimensions, (length x width x height)

126x74x136 mm

Weight, not more

3 kg

Note: All specifications are provided by the manufacturer and may be subject to change. Please contact us to confirm the latest specifications before placing your order.

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Shipping Terms

FOB Novorossiysk, RussiaCIF Available to major ports worldwideEXW Manufacturer's facility, Russia

Delivery Time

Sea freight: 30-60 days (depending on destination) Air freight: 14-21 days (for urgent orders)

Payment Methods

Letter of Credit (L/C)Wire Transfer (T/T)Escrow Services

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Ion Source II-125 for Ion Beam Applications and Ion Processing

Description

Specifications

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