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Aqueous Solution of Tetraethylammonium Hydroxide TMAH 20% for Organic Synthesis and Etching

Specialty Chemical Products

Manufacturer: NIOPIK OJSC

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FOB, CIF & EXW terms available

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Description

For applications in organic synthesis, analytical chemistry, anisotropic etching of silicon and gallium arsenide, and is also the basis for the production of metal-free developer for photoresist films and photoresist mask removal.

Specifications

Hydrogen index, pH units

Carbon dioxide salt concentration (in terms of CO2)

Not more than 1.00 %

appearance

Transparent liquid without mechanical inclusions

Concentration of tetramethylammonium hydroxide

20 %

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Shipping Terms

FOB Novorossiysk, Russia CIF Available to major ports worldwide EXW Manufacturer's facility, Russia

Delivery Time

Sea freight: 30-60 days (depending on destination) Air freight: 14-21 days (for urgent orders)

Payment Methods

Letter of Credit (L/C) Wire Transfer (T/T) Escrow Services

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Aqueous Solution of Tetraethylammonium Hydroxide TMAH 20% for Organic Synthesis and Etching

Description

Specifications

Share your requirements for a quick response!