The Kepler vacuum sputtering platform is designed for large-scale sputtering equipment. Plants built on this platform are used in small batch and serial production.
A key feature of this platform is the placement of process devices on the side walls and doors of the vacuum chamber, which greatly simplifies the maintenance of process devices. The substrates are placed on the planetary-type substrate holder.
The vacuum chamber has the shape of a polyhedron or a vertical cylinder.
Advantages
-High productivity.
-All elements of the vacuum system are made of non-magnetic stainless steel of 12?18?10?/AISI321, 08?18?10/ AISI304 grades.
-Surfaces facing the vacuum are machined to roughness Ra0,8, which guarantees minimum degassing and, as a consequence, reduced pumping time.
-The possibility of using several technological devices: magnetron, vacuum-arc evaporator...
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