A photolithography cluster line is a set of technological modules carrying out various types of photolithographic processing. The modules are placed in a controlled air environment on a common carrier frame of closed configuration and are united by a single transport device in the form of a specialised robot. The photolithography cluster line combines the operations of photoresist mask formation for the technological process with design standards up to 0.35÷0.18 microns on wafers of 150 and 200 mm diameter and represents high-tech equipment for performing the stages of wafer cleaning, adhesion promoter treatment, photoresist application, drying, thermal stabilisation, developer.
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