产品 — 真空镀膜与等离子化学设备
Plasma-Chemical Deposition Vacuum System with ICP Source - Izofaz TM 200-01
¥648,000-2,592,000
NIITM OJSC 🇷🇺
Four-Position Vacuum Coating System with Magnetron Sputtering MAGNA TM 5
¥648,000-2,160,000
NIITM OJSC 🇷🇺
Plasma Chemical Etching Vacuum System with ICP Source and Cassette Loading TM 300
¥648,000-2,592,000
NIITM OJSC 🇷🇺
Compact Vacuum Coating System for Magnetron Sputtering, Model MVU Magna 12
¥648,000-2,160,000
NIITM OJSC 🇷🇺
Compact Plasma Cleaning Vacuum System for Photoresist Removal and Sterilization TM 4
¥108,000-345,600
NIITM OJSC 🇷🇺
Vacuum Coating System with Magnetron Sputtering and Cassette Loading MAGNA TM 29
¥648,000-2,160,000
NIITM OJSC 🇷🇺
Plasma Chemical Deposition Vacuum System with ICP Source and Cassette Loader
¥648,000-2,592,000
NIITM OJSC 🇷🇺
Plasma Chemical Anisotropic Selective Etching System Plasma TM 200-01
¥648,000-2,160,000
NIITM OJSC 🇷🇺
