Heat Treatment & Quenching Furnaces
Vacuum Furnaces
Food Processing Equipment
Industrial Filters
Separators (Magnetic, Optical, Gas-Liquid)
Industrial Mills & Crushers
Muffle, Lab & Specialty Furnaces
Cyclones & Dust Collectors
Industrial Mixers & Blenders
Melting & Induction Furnaces
Separation Vessels & Process Tanks
Industrial Dryers (Machines, Cabinets, Chambers)
Reactors & Autoclaves
Oily Water Treatment Equipment
Rolling Mills & Metallurgy Equipment
Columns & Heat Exchangers
Centrifuges & Decanters
Other Process Equipment
Hoppers & Feeders
Gasification & Nitrogen Plants
Electroplating & Coating Lines
Industrial Burners
Industrial Screens & Classifiers
Dosers & Batching Stations
Incinerators & Waste Disposal
Laser Marking & Engraving Equipment
Food Production Lines
Filling, Packaging & Bottling Machines
Washing & Cleaning Equipment
Industrial Vacuum Cleaners
Scrubbers, Electrostatic Filters & Gas Cleaning
Industrial Washer-Extractors
Process Modules & Skids
Fuel Dispensing & Gas Station Equipment
Vacuum Deposition & Plasma Chemistry Plants
Waterjet & Sandblasting Systems
Other Process Equipment
产品 — 加工设备
Plasma-Chemical Deposition Vacuum System with ICP Source - Izofaz TM 200-01
¥648,000-2,592,000
NIITM OJSC 🇷🇺
Four-Position Vacuum Coating System with Magnetron Sputtering MAGNA TM 5
¥648,000-2,160,000
NIITM OJSC 🇷🇺
Plasma Chemical Etching Vacuum System with ICP Source and Cassette Loading TM 300
¥648,000-2,592,000
NIITM OJSC 🇷🇺
Compact Vacuum Coating System for Magnetron Sputtering, Model MVU Magna 12
¥648,000-2,160,000
NIITM OJSC 🇷🇺
Compact Plasma Cleaning Vacuum System for Photoresist Removal and Sterilization TM 4
¥108,000-345,600
NIITM OJSC 🇷🇺
Vacuum Coating System with Magnetron Sputtering and Cassette Loading MAGNA TM 29
¥648,000-2,160,000
NIITM OJSC 🇷🇺
Plasma Chemical Deposition Vacuum System with ICP Source and Cassette Loader
¥648,000-2,592,000
NIITM OJSC 🇷🇺
Plasma Chemical Anisotropic Selective Etching System Plasma TM 200-01
¥648,000-2,160,000
NIITM OJSC 🇷🇺
