The vacuum spraying unit UVN-71P-3M-2 is designed for
one-sided deposition of metallic and resistive films on polycor and
satin substrates by magnetron vacuum sputtering method in the production of
hybrid-film microchips.
Maximum number of substrates with the size of
60x48x(0,5...1,0) mm 11 pcs.
The unit has 3 magnetron evaporators.
Time of achievement of residual pressure 4 x 10-4 Pa in the working chamber
after opening of the high-vacuum shutter not more than 60 min.
The unit provides:
-regulation of rotation speed of the carousel with
substrates in the range from 10 to 60 rpm;
-heating of the carousel with substrates up to 300 °C;
-control of the witness resistance
of film sputtering on the substrates in the range from 0 to 100 kOhm;
- ion source power up to 200 W;
-power of the first magnetron evaporator
of the first magnetron evaporator of adhesive material up to 2 kW;
-power of the second magnetron vaporiser
of the second magnetron evaporator of conductive material and the third magnetron evaporator of resistive material...
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